Titanium polishing is a process to polish titanium and titanium alloys to a high degree of surface smoothness, typically of a nanometer level. The polishing method is based on an electrolytic process in which material is removed from the surface by a chemical reaction powered by applying a low voltage.
Technology used at CERN to polish the cavities of the accelerators to obtain an ultra smooth surface and to avoid sparks.
Area of expertise
- Vacuum technology
- Medical industry: implants, tools
- Jewelleries, spectacles frames, watches
- Aerospace: turbine blades
- Electronics, storage discs
- The chemical composition of the bath
- The polishing method
- Temperature of bath: 10 – 30 degrees C
- Achievable roughness: Ra of around 0.05 to 0.10 µm
- Voltage: approximately 10 V
- Polishing speed: 1 – 2,5 µm/minute. Applied current: 5 – 14 A/dm2
- The metal can be polished down to the nanometer level
- Enables efficient detection of flaws in the surface
- The process can be run with low power consumption
- Creates a shining, mirror like appearance
- Provides easy maintenance of hygienically clean surfaces due to reduced particle adhesion
- There is practically no size limitation on the item to be polished
- Provides metallic purity and chemical passivity
Intellectual Property status
Available for licensing and partnerships. Patent granted in Europe, France, Russia and USA. PCT. WO0100906.